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Large-area, high-resolution pattern replication by the use of a two-aspherical-mirror system.

H Kinoshita, K Kurihara, T Mizota

|September 22, 2010

Summary

This summary is machine-generated.

Researchers developed a soft-x-ray projection lithography system using multilayer mirrors and aspherical optics. Despite mirror figure errors, they achieved a large exposure area with fine patterns, demonstrating system feasibility for high-throughput applications.

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Area of Science:

Optics and Photonics
Materials Science
Semiconductor Manufacturing

Background:

Soft-x-ray projection lithography is crucial for advanced semiconductor manufacturing.
Achieving high throughput and large exposure areas with high resolution remains a challenge.

Purpose of the Study:

To develop and evaluate a soft-x-ray projection lithography system using multilayer mirrors and aspherical optics.
To determine the feasibility of achieving a high throughput and large exposure area for microfabrication.

Main Methods:

Development of a reduction system employing two aspherical-mirror optics.
Evaluation of aspherical mirror figure errors using a laser interferometer.
Compensation for aberrations through precise adjustment of mirror positions.

Main Results:

The root-mean-square (rms) figure errors of the concave and convex mirrors were 8.8 nm and 2.0 nm, respectively.
These errors were insufficient for achieving a 0.1 µm resolution directly.
An exposure area exceeding 10 mm × 0.6 mm was successfully demonstrated with fine patterns below a quarter micrometer.

Conclusions:

The developed soft-x-ray projection lithography system shows promise for high-throughput applications.
Aberration compensation techniques are effective in mitigating mirror imperfections.
The system achieved a large exposure area with sub-quarter-micrometer patterning, validating its potential for next-generation lithography.