Image scanning ellipsometry for measuring nonuniform film thickness profiles

Area of Science:

• Materials Science
• Optical Physics
• Surface Science

Background:

• Accurate measurement of thin film thickness is crucial for material characterization.
• Existing techniques may lack spatial resolution or the ability to analyze dynamic processes.
• Nonuniform thin films present unique challenges in thickness profiling.

Purpose of the Study:

• To introduce a novel technique for measuring the 2-D thickness profile of thin films.
• To demonstrate the capabilities of Image Scanning Ellipsometry (ISE) in both steady and transient states.
• To showcase the high spatial resolution and thickness sensitivity of ISE.

Main Methods:

• Development and testing of a novel technique: Image Scanning Ellipsometry (ISE).
• ISE is a full-field imaging technique enabling simultaneous analysis of all surface points.
• Utilizes high spatial resolution and thickness sensitivity for detailed mapping.

Main Results:

• Successfully developed and tested a technique to measure 2-D thickness profiles.
• Demonstrated ISE's capability to map thickness from nanometers to micrometers.
• Validated ISE for both steady-state and transient film conditions.

Conclusions:

• Image Scanning Ellipsometry (ISE) is an effective method for 2-D thin film thickness profiling.
• ISE offers simultaneous, high-resolution analysis across the entire film surface.
• The technique is suitable for diverse applications requiring precise thin film characterization.