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Related Experiment Video

Updated: Jun 8, 2026

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
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Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope

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Electron-beam writing system and its application to large and high-density diffractive optic elements.

S Ogata, M Tada, M Yoneda

    Applied Optics
    |October 2, 2010
    PubMed
    Summary
    This summary is machine-generated.

    A novel electron-beam writing system enables fabrication of high-density microgratings for diffractive optics. This stationary beam, spinning table system overcomes deflection limits for precise, large-area axisymmetric pattern creation.

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    Last Updated: Jun 8, 2026

    Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
    10:25

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    Published on: September 14, 2018

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    Free-form Light Actuators — Fabrication and Control of Actuation in Microscopic Scale
    08:17

    Free-form Light Actuators — Fabrication and Control of Actuation in Microscopic Scale

    Published on: May 25, 2016

    Area of Science:

    • Optics and Photonics
    • Microfabrication Technologies
    • Electron Beam Lithography

    Background:

    • Fabricating diffractive optical elements with axisymmetric patterns, such as microgratings, presents challenges, especially for large areas exceeding electron-beam deflection capabilities.
    • Existing methods may struggle with achieving high-density, precisely controlled microstructures required for advanced optical applications.

    Purpose of the Study:

    • To propose and develop a novel electron-beam writing system for fabricating diffractive optical elements with axisymmetric patterns.
    • To overcome the limitations of electron-beam deflection for creating large-area, high-density microgratings.
    • To demonstrate the system's capability in producing complex micro-optical components.

    Main Methods:

    • Utilizing a stationary electron beam combined with a continuously spinning table for continuous writing.
    • Implementing multiple-revolution writing strategies for fine electron-dose distribution control.
    • Employing electron-beam modulation techniques for enhanced pattern fidelity.
    • Integrating real-time data processing for dynamic control during fabrication.

    Main Results:

    • Successfully fabricated continuously concentric and radialized high-density microgratings with effective areas beyond standard electron-beam deflection limits.
    • Demonstrated the fabrication of a rotary encoder disk with a 1.57-µm grating pitch and a 15-mm diameter.
    • Successfully produced a blazed micro-Fresnel lens with a 4.5-mm diameter and a numerical aperture (N.A.) of 0.45.

    Conclusions:

    • The proposed electron-beam writing system effectively enables the fabrication of large-area, high-density microgratings for diffractive optical elements.
    • The system's ability to overcome deflection limits and achieve fine dose control is crucial for producing complex axisymmetric optical components.
    • Successful demonstration of test gratings validates the system's potential for advanced micro-optics manufacturing.