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Updated: Jun 8, 2026

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
Published on: September 14, 2018
A novel electron-beam writing system enables fabrication of high-density microgratings for diffractive optics. This stationary beam, spinning table system overcomes deflection limits for precise, large-area axisymmetric pattern creation.
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