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Updated: Jun 8, 2026

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
Published on: September 14, 2018
A demonstration of the effectiveness of a single aberration correction per optical slice in beam scanned optically
Simon P Poland1, Amanda J Wright1, Stuart Cobb2
1Institute of Photonics, SUPA, University of Strathclyde, Wolfson Centre, 106 Rottenrow, Glasgow G4 0NW, United Kingdom.
Abstract:
In this paper we report the use of adaptive optics to correct for sample induced aberrations in optical microscopy, crucially comparing individual pixel-by-pixel correction against a single correction for an entire optical section. Sample induced optical aberrations in slices of rat brain tissue were corrected with a deformable membrane mirror. Using axial resolution measurements, we demonstrate that a single aberration correction per optical slice achieves around 80% of the maximum possible improvement compared to individual pixel-by-pixel correction in both confocal and multiphoton microscopy. A single aberration correction per depth, compared to pixel-by-pixel aberration correction, significantly decreases scan times and therefore reduces photobleaching and phototoxic effects enabling more rapid microscopy with active aberration correction. The results confirm that the use of a "look-up" table, based upon sample type and depth, may be the most practical way of implementing adaptive optic aberration correction in beam scanning optical sectioning microscopy.
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