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Wafer fault measurement by coherent optical processor.

X Y Cai, F Kvasnik, R W Blore

    Applied Optics
    |October 12, 2010
    PubMed
    Summary

    A novel optical processor detects registration errors in integrated-circuit wafers. This method efficiently identifies wafer faults, improving semiconductor manufacturing quality control.

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    Area of Science:

    • Optoelectronics
    • Semiconductor Manufacturing
    • Optical Metrology

    Background:

    • Integrated circuit (IC) fabrication involves multiple layers, requiring precise alignment.
    • Registration errors between layers can lead to device failure and yield loss.
    • Automated inspection methods are crucial for high-volume semiconductor production.

    Purpose of the Study:

    • To apply a microscope coherent optical processor for measuring registration errors in multilayer IC wafers.
    • To analyze the impact of wafer faults on the optical correlation signal.
    • To demonstrate a rapid and easy method for detecting faults in partially processed wafers.

    Main Methods:

    • Utilizing a VanderLugt optical correlator-based system for optical processing.
    • Analyzing the correlation signal's response to various wafer faults.
    • Implementing threshold criteria and peak splitting analysis on the correlation signal.

    Main Results:

    • Wafer faults significantly affect the correlation signal characteristics.
    • Fault-induced peak splitting in the correlation signal was observed.
    • The method successfully detected faults in reject production samples.

    Conclusions:

    • The optical processor effectively measures registration errors in multilayer IC wafers.
    • The technique provides easy and rapid detection of faults.
    • This method enhances quality control in semiconductor manufacturing.

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