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Determination of the Excitation and Coupling Rates Between Light Emitters and Surface Plasmon Polaritons
07:39

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Published on: July 21, 2018

Polarized light reflectometer.

R M Azzam

    Applied Optics
    |October 12, 2010
    PubMed
    Summary
    This summary is machine-generated.

    This study introduces a method to measure surface reflectance using polarized light, enabling precise determination of optical properties for dielectric and semiconductor materials.

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    Published on: December 2, 2017

    Area of Science:

    • Materials Science
    • Optics
    • Surface Science

    Background:

    • Accurate characterization of optical properties like reflectance is crucial for semiconductor device fabrication and analysis.
    • Existing methods may lack precision or require specialized equipment for determining thin film parameters.

    Purpose of the Study:

    • To develop a novel optical technique for measuring absolute reflectances (R(p) and R(s)) of surfaces.
    • To apply this technique for determining the refractive index and thickness of silicon dioxide (SiO(2)) films on silicon (Si) detectors.

    Main Methods:

    • Modulating reflected and non-reflected light fluxes while varying the azimuth of incident linearly polarized light.
    • Measuring light fluxes to calculate absolute p-polarized (R(p)) and s-polarized (R(s)) reflectances.
    • Applying the reflectance measurements to a silicon detector with a SiO(2) film.

    Main Results:

    • The method successfully yields absolute reflectances for dielectric and semiconductor surfaces.
    • The application to a Si detector allowed for the determination of the refractive index and thickness of the SiO(2) film.
    • Demonstrated the capability of the technique in characterizing thin dielectric films.

    Conclusions:

    • The described method provides an accurate and accessible way to measure surface absolute reflectances.
    • This technique is effective for non-destructively characterizing thin dielectric films on semiconductor substrates.
    • Offers a valuable tool for optical metrology in materials science and semiconductor industries.