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Demonstration of submicron square-like silicon waveguide using optimized LOCOS process.

Boris Desiatov1, Ilya Goykhman, Uriel Levy

  • 1Department of Applied Physics, The Benin School of Engineering and Computer Science, The Center for Nanoscience and Nanotechnology, The Hebrew University of Jerusalem, Jerusalem, 91904, Israel.

Optics Express
|October 14, 2010
PubMed
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We developed submicron silicon waveguides using local oxidation for precise control over dimensions and smooth sidewalls. These waveguides exhibit low loss, crucial for integrated photonics applications.

Area of Science:

  • Materials Science
  • Nanotechnology
  • Photonics

Background:

  • Integrated photonics relies on efficient light manipulation within micro/nanoscale structures.
  • Silicon photonics offers a platform for miniaturized optical circuits, but fabrication challenges remain.

Purpose of the Study:

  • To design and fabricate submicron-scale silicon waveguides.
  • To characterize the optical properties and loss of these waveguides.

Main Methods:

  • Utilized local oxidation of silicon (LOCOS) for waveguide fabrication.
  • Employed near-field scanning optical microscopy (NSOM) for characterization at 1550 nm.
  • Analyzed light scattering using an infrared camera to assess loss.

Main Results:

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  • Achieved precise control over waveguide geometry and smooth sidewalls.
  • Measured a mode width of 0.4 µm and an effective refractive index of 2.54.
  • Demonstrated low loss characteristics through light scattering imaging.

Conclusions:

  • Local oxidation of silicon is an effective method for fabricating submicron waveguides.
  • The fabricated waveguides possess desirable optical properties for integrated photonic applications.
  • The demonstrated low loss indicates potential for efficient light propagation.