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Updated: Jun 7, 2026
12:14
The Generation of Higher-order Laguerre-Gauss Optical Beams for High-precision Interferometry
Published on: August 12, 2013
Diffraction-attenuation resistant beams: their higher-order versions and finite-aperture generations
Michel Zamboni-Rached1, Leonardo A Ambrósio, Hugo E Hernández-Figueroa
1Department of Microwaves and Optics, School of Electrical and Computer Engineering, University of Campinas, Campinas SP, Brazil. mzamboni@dmo.fee.unicamp.br
Applied Optics
|October 22, 2010
Summary
New Bessel beams resist diffraction and absorption even with finite apertures. This method enhances control over beam profiles for applications in optics and sensing.
Area of Science:
- Optics and Photonics
- Wave Phenomena
Background:
- Bessel beams offer diffraction-resistant properties.
- Previous methods required ideal beam generation.
Purpose of the Study:
- To demonstrate diffraction and attenuation resistance in Bessel beams generated by finite apertures.
- To extend Bessel beam generation methods for greater control over transverse intensity profiles.
Main Methods:
- Superposition of ideal zero-order Bessel beams.
- Analysis of beam propagation in absorbing media.
- Extension of the superposition method for finite aperture generation.
Main Results:
- Beams maintain diffraction and attenuation resistance when generated by finite apertures.
- The extended method allows for enhanced control over beam transverse intensity profiles.
- The method is applicable to both scalar and paraxial vector wave fields.
Conclusions:
- Finite aperture generation does not compromise the unique properties of these Bessel beams.
- The enhanced method provides greater flexibility for practical applications.
- These beams show promise for free-space optics, medical imaging, remote sensing, and optical tweezers.
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