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Determination of the Excitation and Coupling Rates Between Light Emitters and Surface Plasmon Polaritons
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Sub-50 nm patterning by immersion interference lithography using a Littrow prism as a Lloyd's interferometer.

Johannes de Boor1, Dong Sik Kim, Volker Schmidt

  • 1Max-Planck Institute of Microstructure Physics, Weinberg 2, 06120 Halle, Germany. deboor@mpi‑halle.mpg.de

Optics Letters
|October 23, 2010
PubMed
Summary

We developed a novel lithography setup using a prism and immersion technique to create nanoscale patterns. This method achieves sub-100nm line patterns with high precision, advancing microfabrication capabilities.

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Area of Science:

  • Nanotechnology
  • Optics
  • Materials Science

Background:

  • Lloyd's mirror interferometers are established for creating periodic nanostructures.
  • Achieving smaller structure sizes in lithography requires advanced techniques.

Purpose of the Study:

  • To develop a simplified lithography setup for fabricating smaller nanoscale structures.
  • To enhance the resolution of interference lithography using immersion and a prism-based mirror.

Main Methods:

  • Combined immersion lithography with a modified Lloyd's mirror interferometer.
  • Replaced the standard mirror with a metal-coated triangular Littrow prism.
  • Utilized a 244nm laser for pattern generation.

Main Results:

  • Successfully produced line patterns with periods under 100nm.
  • Achieved line widths as small as 45nm.
  • Demonstrated significant reduction in attainable structure sizes due to the prism's higher refractive index.

Conclusions:

  • The modified setup offers a simpler and more effective approach to high-resolution nanolithography.
  • The use of a prism enhances resolution by reducing the effective wavelength.
  • The technique retains the flexibility in periodicity characteristic of Lloyd's mirror interferometers.