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Related Experiment Video

Updated: Jun 7, 2026

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
10:25

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope

Published on: September 14, 2018

Measuring and modeling the proximity effect in direct-write electron-beam lithography kinoforms.

F Nikolajeff, J Bengtsson, M Larsson

    Applied Optics
    |November 2, 2010
    PubMed
    Summary
    This summary is machine-generated.

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    The proximity effect in electron-beam lithography gratings was measured. Development time significantly impacts the writing component of the point-spread function, while the background component is less affected.

    Area of Science:

    • Materials Science
    • Nanotechnology
    • Physics

    Background:

    • Direct-write electron-beam lithography (EBL) is crucial for fabricating nanostructures.
    • Understanding proximity effects is essential for precise pattern replication in EBL.
    • Successively developed gratings present a unique system to study these effects.

    Purpose of the Study:

    • To quantify the proximity effect in direct-write EBL gratings.
    • To determine the parameters of the point-spread function governing the proximity effect.
    • To analyze the influence of development time on different components of the point-spread function.

    Main Methods:

    • Measurement of diffraction orders from EBL-fabricated gratings.
    • Analysis of grating relief shapes derived from diffraction power.

    More Related Videos

    Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography
    07:47

    Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography

    Published on: February 12, 2017

    Related Experiment Videos

    Last Updated: Jun 7, 2026

    Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
    10:25

    Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope

    Published on: September 14, 2018

    Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography
    07:47

    Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography

    Published on: February 12, 2017

  • Modeling the proximity effect using a double Gaussian point-spread function.

    • Main Results:

    • Grating relief shapes were successfully determined from diffraction measurements.
    • The point-spread function parameters were accurately extracted.
    • A significant increase in the writing component of the point-spread function was observed with longer development times.

    Conclusions:

    • Development time is a critical factor influencing the proximity effect in EBL.
    • The writing and background components of the point-spread function exhibit different sensitivities to development time.
    • This study provides quantitative insights into proximity effect mitigation strategies in EBL.