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Degradation pattern of SnO(2) nanowire field effect transistors
Junhong Na1, Junghwan Huh, Sung Chan Park
1School of Electrical Engineering, Korea University, Seoul 136-701, Korea.
Abstract:
The degradation pattern of SnO(2) nanowire field effect transistors (FETs) was investigated by using an individual SnO(2) nanowire that was passivated in sections by either a PMMA (polymethylmethacrylate) or an Al(2)O(3) layer. The PMMA passivated section showed the best mobility performance with a significant positive shift in the threshold voltage. The distinctive two-dimensional R(s)-μ diagram based on a serial resistor connected FET model suggested that this would be a useful tool for evaluating the efficiency for post-treatments that would improve the device performance of a single nanowire transistor.
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