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Updated: Jun 6, 2026

Large-area Scanning Probe Nanolithography Facilitated by Automated Alignment and Its Application to Substrate Fabrication for Cell Culture Studies

Large-area Scanning Probe Nanolithography Facilitated by Automated Alignment and Its Application to Substrate Fabrication for Cell Culture Studies

Published on: June 12, 2018

Scanning probe block copolymer lithography.

Jinan Chai¹, Fengwei Huo, Zijian Zheng

¹Department of Chemistry, International Institute for Nanotechnology, Northwestern University, 2145 Sheridan Road, Evanston, IL 60208, USA.

Proceedings of the National Academy of Sciences of the United States of America

|November 10, 2010

Summary

This summary is machine-generated.

Researchers developed scanning probe block copolymer lithography to precisely position and size individual nanoparticles. This breakthrough enables controlled nanoparticle placement for advanced material applications.

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Large-area Scanning Probe Nanolithography Facilitated by Automated Alignment and Its Application to Substrate Fabrication for Cell Culture Studies

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Fabricating Reactive Surfaces with Brush-like and Crosslinked Films of Azlactone-Functionalized Block Co-Polymers

Fabricating Reactive Surfaces with Brush-like and Crosslinked Films of Azlactone-Functionalized Block Co-Polymers

Published on: June 30, 2018

Area of Science:

Nanotechnology
Materials Science
Surface Chemistry

Background:

Precise arrangement of individual nanoparticles is crucial for their unique properties.
Current methods struggle with positioning sub-10-nm nanoparticles accurately over large areas.

Purpose of the Study:

To develop a novel technique for controlled in situ growth and positioning of individual nanoparticles.
To enable precise control over nanoparticle size and location.

Main Methods:

Developed scanning probe block copolymer lithography.
Utilized dip-pen nanolithography (DPN) or polymer pen lithography (PPL) to pattern block copolymer inks.
Employed plasma reduction of metal ions to form nanoparticles within patterned features.

Main Results:

Achieved high-yield formation of single-crystal nanoparticles.
Demonstrated precise control over nanoparticle size, down to 4.8 ± 0.2 nm.
Enabled controlled positioning of individual nanoparticles on a substrate.

Conclusions:

Scanning probe block copolymer lithography offers a robust method for nanoparticle fabrication and integration.
This technique overcomes previous limitations in nanoparticle positioning and size control.
Facilitates the exploitation of nanoparticle properties in various applications.