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Related Experiment Video

Updated: Jun 6, 2026

Investigation of Early Plasma Evolution Induced by Ultrashort Laser Pulses
11:20

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Published on: July 2, 2012

New laser plasma source for extreme-ultraviolet lithography.

F Jin, M Richardson

    Applied Optics
    |November 10, 2010
    PubMed
    Summary
    This summary is machine-generated.

    Researchers explored a novel laser plasma source using ice-water targets for extreme-ultraviolet (EUV) lithography. This new source shows promise for meeting critical requirements in advanced chip fabrication.

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    Non-equilibrium Microwave Plasma for Efficient High Temperature Chemistry
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    Area of Science:

    • Optics and Photonics
    • Materials Science
    • Semiconductor Manufacturing

    Background:

    • Advancing semiconductor fabrication requires smaller feature sizes, driving the need for advanced lithography techniques.
    • Extreme-ultraviolet (EUV) lithography is a key technology for next-generation chip manufacturing.
    • High-repetition-rate laser plasma sources are essential for efficient EUV lithography.

    Purpose of the Study:

    • To investigate a new laser plasma source candidate for EUV lithography.
    • To evaluate the potential of line emission from ice-water targets for EUV generation.
    • To assess the suitability of this source for demonstration lithographic systems.

    Main Methods:

    • Utilized ice-water targets for laser plasma generation.
    • Investigated line emission characteristics of the plasma.
    • Evaluated key performance metrics relevant to lithography.

    Main Results:

    • Identified a promising new laser plasma source based on ice-water targets.
    • Demonstrated potential for meeting stringent EUV conversion efficiency requirements.
    • Showcased feasibility for debris elimination and operational stability.

    Conclusions:

    • The ice-water target laser plasma source is a viable candidate for EUV lithography.
    • This approach offers a potential solution for cost-effective and high-performance EUV generation.
    • The source meets critical requirements for demonstration lithographic systems.