Search research articles

ABOUT JoVE

Overview Leadership Blog JoVE Help Center

AUTHORS

Publishing Process Editorial Board Scope & Policies Peer Review FAQ Submit

LIBRARIANS

Testimonials Subscriptions Access Resources Library Advisory Board FAQ

RESEARCH

JoVE Journal Methods Collections JoVE Encyclopedia of Experiments Archive

EDUCATION

JoVE Core JoVE Business JoVE Science Education JoVE Lab Manual Faculty Resource Center Faculty Site

Terms & Conditions of Use

Related Concept Videos

You might also read

Related Articles

Articles linked to this work by shared authors, journal, and citation graph.

Sort by

Same author

Effectiveness of case-based learning combined with problem-based learning versus lecture-based learning in clinical medical education: a systematic review and meta-analysis.

Postgraduate medical journal·2026

Same author

Effectiveness of Team-Based Learning Compared with Lecture-Based Learning in Clinical Medicine: A Meta-Analysis.

Journal of the College of Physicians and Surgeons--Pakistan : JCPSP·2025

Same author

Whether case-based teaching combined with the flipped classroom is more valuable than traditional lecture-based teaching methods in clinical medical education: a systematic review and meta-analysis.

BMC medical education·2025

Same author

Genomics-driven discovery of the biosynthetic gene cluster of maduramicin and its overproduction in Actinomadura sp. J1-007.

Journal of industrial microbiology & biotechnology·2019

Same author

Synthesis and high pressure studies of white luminescence host-guest complex nanocrystals based on C<sub>60</sub> and p-But-calix[8]arene.

Nanotechnology·2019

Same author

Multicompartmental Toxicokinetic Modeling of Discrete Dietary and Continuous Waterborne Uptake of Two Polycyclic Aromatic Hydrocarbons by Zebrafish <i>Danio rerio</i>.

Environmental science & technology·2019

Search research articles

Related Experiment Video

Updated: Jun 6, 2026

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope

Published on: September 14, 2018

A new chemically amplified resist for high resolution patterning by E-beam lithography.

Bing-Rui Lu¹, Yifang Chen, Ejaz Huq

¹Micro and Nanotechnology Center, Rutherford Appleton Laboratory Chilton, Didcot, Oxon, OX11 0QX, UK.

Journal of Nanoscience and Nanotechnology

|December 9, 2010

Summary

Chemically amplified resist UV1116 shows improved lithography quality compared to UVIII. This new resist offers better sensitivity, resolution, and plasma etch resistance for advanced applications.

More Related Videos

Surface Enhanced Raman Spectroscopy Detection of Biomolecules Using EBL Fabricated Nanostructured Substrates

Surface Enhanced Raman Spectroscopy Detection of Biomolecules Using EBL Fabricated Nanostructured Substrates

Published on: March 20, 2015

Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography

Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography

Published on: February 12, 2017

Related Experiment Videos

Last Updated: Jun 6, 2026

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope

Published on: September 14, 2018

Surface Enhanced Raman Spectroscopy Detection of Biomolecules Using EBL Fabricated Nanostructured Substrates

Surface Enhanced Raman Spectroscopy Detection of Biomolecules Using EBL Fabricated Nanostructured Substrates

Published on: March 20, 2015

Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography

Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography

Published on: February 12, 2017

Area of Science:

Materials Science
Nanotechnology
Chemical Engineering

Background:

Chemically amplified resists (CARs) are crucial for advanced lithography.
Evaluating new CAR materials is essential for improving microfabrication processes.

Purpose of the Study:

To evaluate the lithography properties of UV1116, a new CAR from Rohm and Haas.
To compare UV1116 performance against the existing UVIII resist.

Main Methods:

Systematic evaluation of electron-beam lithography (EBL) properties.
Assessment of sensitivity, contrast, resolution, and dense pattern capability.
Analysis of plasma dry etching resistance.

Main Results:

UV1116 demonstrated superior lithography quality compared to UVIII.
Detailed characterization of UV1116's EBL performance was conducted.
The resist exhibited favorable plasma etch resistance.

Conclusions:

UV1116 is a viable alternative to UVIII for lithography applications.
The new resist offers enhanced lithographic performance and quality.
UV1116 shows promise for advanced microfabrication.