Jove
Visualize
Contact Us
JoVE
x logofacebook logolinkedin logoyoutube logo
ABOUT JoVE
OverviewLeadershipBlogJoVE Help Center
AUTHORS
Publishing ProcessEditorial BoardScope & PoliciesPeer ReviewFAQSubmit
LIBRARIANS
TestimonialsSubscriptionsAccessResourcesLibrary Advisory BoardFAQ
RESEARCH
JoVE JournalMethods CollectionsJoVE Encyclopedia of ExperimentsArchive
EDUCATION
JoVE CoreJoVE BusinessJoVE Science EducationJoVE Lab ManualFaculty Resource CenterFaculty Site
Terms & Conditions of Use
Privacy Policy
Policies

Related Concept Videos

You might also read

Related Articles

Articles linked to this work by shared authors, journal, and citation graph.

Sort by
Same author

Tunable directional thermal emission using a phase change material-based multilayer structure.

Nanoscale horizons·2025
Same author

Phase change material-based tunable Fano resonant optical coatings and their applications.

Nanophotonics (Berlin, Germany)·2024
Same author

Dual-Phase Singularity at a Single Incident Angle with Spectral Tunability in Tamm Cavities.

Advanced materials (Deerfield Beach, Fla.)·2024
Same author

Fluid-responsive tunable metasurfaces for high-fidelity optical wireless communication.

Materials horizons·2024
Same author

Aperiodic Bragg Reflectors for Tunable High-Purity Structural Color Based on Phase Change Material.

Nano letters·2024
Same author

Erratum: Roadmap for phase change materials in photonics and beyond.

iScience·2023

Related Experiment Video

Updated: Jun 6, 2026

Determination of the Excitation and Coupling Rates Between Light Emitters and Surface Plasmon Polaritons
07:39

Determination of the Excitation and Coupling Rates Between Light Emitters and Surface Plasmon Polaritons

Published on: July 21, 2018

Interferometric lithography for nanoscale feature patterning: a comparative analysis between laser interference,

Kandammathe Valiyaveedu Sreekanth1, Jeun Kee Chua, Vadakke Matham Murukeshan

  • 1School of Mechanical and Aerospace Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798.

Applied Optics
|December 15, 2010
PubMed
Summary

This study compares three interference lithography methods for creating patterns on photoresists. Surface plasmon interference offers a novel approach for precise, single-exposure patterning of periodic features.

More Related Videos

Characterization of Surface Modifications by White Light Interferometry: Applications in Ion Sputtering, Laser Ablation, and Tribology Experiments
11:47

Characterization of Surface Modifications by White Light Interferometry: Applications in Ion Sputtering, Laser Ablation, and Tribology Experiments

Published on: February 27, 2013

Patterning via Optical Saturable Transitions - Fabrication and Characterization
08:19

Patterning via Optical Saturable Transitions - Fabrication and Characterization

Published on: December 11, 2014

Related Experiment Videos

Last Updated: Jun 6, 2026

Determination of the Excitation and Coupling Rates Between Light Emitters and Surface Plasmon Polaritons
07:39

Determination of the Excitation and Coupling Rates Between Light Emitters and Surface Plasmon Polaritons

Published on: July 21, 2018

Characterization of Surface Modifications by White Light Interferometry: Applications in Ion Sputtering, Laser Ablation, and Tribology Experiments
11:47

Characterization of Surface Modifications by White Light Interferometry: Applications in Ion Sputtering, Laser Ablation, and Tribology Experiments

Published on: February 27, 2013

Patterning via Optical Saturable Transitions - Fabrication and Characterization
08:19

Patterning via Optical Saturable Transitions - Fabrication and Characterization

Published on: December 11, 2014

Area of Science:

  • Optics and Photonics
  • Materials Science
  • Nanotechnology

Background:

  • Interference lithography is crucial for fabricating periodic structures.
  • Existing methods face limitations in resolution and complexity.
  • Advanced techniques are needed for efficient nanoscale patterning.

Purpose of the Study:

  • To experimentally compare conventional laser, evanescent wave, and surface plasmon interference lithography.
  • To demonstrate single-exposure, multiple-beam interference for patterning.
  • To realize one- and two-dimensional periodic features on photoresists.

Main Methods:

  • Utilizing two-beam and four-beam interference configurations.
  • Employing a custom-fabricated grating for beam manipulation.
  • Experimental verification of theoretical models for interference patterning.

Main Results:

  • Successful demonstration of single-exposure multiple-beam interference lithography.
  • Comparison of the effectiveness of the three interference methods.
  • Fabrication of one- and two-dimensional periodic patterns on photoresists.

Conclusions:

  • Surface plasmon interference presents a promising route for advanced lithography.
  • The demonstrated methods enable efficient patterning of periodic micro/nanostructures.
  • This work advances the capabilities of interference lithography for material fabrication.