Multi-reflected enhancement of fourth harmonic DUV laser generation at 266 nm

Fengjiang Zhuang1, Ning Ye, Chenghui Huang

  • 1Key Laboratory of Optoelectronic Materials Chemistry and Physics, Fujian Institute of Research on the Structure of Matter, Chinese Academy of Sciences, Fuzhou, Fujian 350002, China.

Optics Express
|December 18, 2010
PubMed