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Updated: Jun 5, 2026

Nanofabrication of Gate-defined GaAs/AlGaAs Lateral Quantum Dots
Published on: November 1, 2013
Narrow emission linewidths of positioned InAs quantum dots grown on pre-patterned GaAs(100) substrates
Joanna Skiba-Szymanska1, Ayesha Jamil, Ian Farrer
1Toshiba Research Europe Ltd, Cambridge Research Laboratory, Cambridge, UK. joanna.skiba@crl.toshiba.co.uk
Abstract:
We report photoluminescence measurements on a single layer of site-controlled InAs quantum dots (QDs) grown by molecular beam epitaxy (MBE) on pre-patterned GaAs(100) substrates with a 15 nm re-growth buffer separating the dots from the re-growth interface. A process for cleaning the re-growth interface allows us to measure single dot emission linewidths of 80 µeV under non-resonant optical excitation, similar to that observed for self-assembled QDs. The dots reveal excitonic transitions confirmed by power dependence and fine structure splitting measurements. The emission wavelengths are stable, which indicates the absence of a fluctuating charge background in the sample and confirms the cleanliness of the re-growth interface.

