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In Vitro Multiparametric Cellular Analysis by Micro Organic Charge-modulated Field-effect Transistor Arrays
Published on: September 20, 2021
Atom probe analysis of a 3D finFET with high-k metal gate
M Gilbert1, W Vandervorst, S Koelling
1Imec, Kapeldreef 75, B-3001 Leuven, Belgium. Matthieu.Gilbert@imec.be
Ultramicroscopy
|January 15, 2011
Abstract:
The atom probe analysis of a full gate stack (metal gate/high-k dielectric) in a 3D finFET is reported. The measurement reliability in this kind of heterogeneous structure is discussed in the light of different artefacts, i.e. mass overlap and 3D reconstruction artefacts.
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