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A synchrotron-based photoemission study of the MoO3∕Co interface
Yu-Zhan Wang1, Ming Yang, Dong-Chen Qi
1Department of Physics, National University of Singapore, 2 Science Drive 3, Singapore 117542, Singapore.
The Journal of Chemical Physics
|January 26, 2011
Summary
Interfacial chemical reactions at the Molybdenum trioxide (MoO3) and Cobalt (Co) interface reduce Mo oxidation states and form Co-O bonds. This creates an interface dipole, increasing cobalt
Area of Science:
- Materials Science
- Surface Science
- Solid State Physics
Background:
- Understanding metal oxide/metal interfaces is crucial for electronic device performance.
- Molybdenum trioxide (MoO3) is a widely studied n-type semiconductor.
- Cobalt (Co) is a common ferromagnetic material used in spintronics.
Purpose of the Study:
- To investigate the electronic structure and chemical reactions at the MoO3/Co interface.
- To determine the impact of these reactions on the interface dipole and work function.
- To identify interface states and their role in charge transport.
Main Methods:
- Synchrotron-based ultraviolet photoelectron spectroscopy (UPS).
- Synchrotron-based x-ray photoelectron spectroscopy (XPS).
Main Results:
- Interfacial chemical reactions observed, leading to Mo oxidation state reduction and Co-O bond formation.
- A significant interface dipole was induced, increasing the work function of the cobalt substrate.
- Two interface states identified at 1.0 and 2.0 eV below the Fermi level.
Conclusions:
- The MoO3/Co interface exhibits complex chemical interactions.
- The induced interface dipole strongly modifies the electronic properties of the cobalt.
- The identified interface states suggest potential for ohmic charge transport through the MoO3 layer.
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