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U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen
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U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen

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Role of the uranyl oxo group as a hydrogen bond acceptor

Lori A Watson1, Benjamin P Hay

  • 1Chemical Sciences Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831-6119, United States.

Inorganic Chemistry
|February 5, 2011
PubMed

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