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Probing C84-embedded Si Substrate Using Scanning Probe Microscopy and Molecular Dynamics
Published on: September 28, 2016
The initial stage of the dissociative adsorption and the surface electronic state evolution of NH3 on Si(111)-(7 × 7)
1State Key Laboratory of Magnetic Resonance and Atomic and Molecular Physics, Wuhan Institute of Physics and Mathematics, Chinese Academy of Sciences, Wuhan 430071, People's Republic of China. Graduate School of the Chinese Academy of Sciences, Beijing 100039, People's Republic of China.
Abstract:
Adsorption of NH3 molecules on Si(111)-(7 × 7) has been studied by scanning tunneling microscopy. We find that the dissociative adsorption is site-selective and exhibits two adsorption structures resulting from different reaction channels: [Formula: see text] and [Formula: see text]. To explain the dissociation processes, an adsorption model for these reactions is given. Furthermore, the evolution of the local electronic structures is investigated by means of atomically resolved scanning tunneling spectroscopy to clarify the effect of different fragments on the surface states. Finally, we discuss the adsorption position of H atoms from the NH3 dissociation.
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