Search research articles

ABOUT JoVE

Overview Leadership Blog JoVE Help Center

AUTHORS

Publishing Process Editorial Board Scope & Policies Peer Review FAQ Submit

LIBRARIANS

Testimonials Subscriptions Access Resources Library Advisory Board FAQ

RESEARCH

JoVE Journal Methods Collections JoVE Encyclopedia of Experiments Archive

EDUCATION

JoVE Core JoVE Business JoVE Science Education JoVE Lab Manual Faculty Resource Center Faculty Site

Terms & Conditions of Use

Related Concept Videos

You might also read

Related Articles

Articles linked to this work by shared authors, journal, and citation graph.

Sort by

Same author

A simple radioassay for detection of antithyroglobulin autoantibodies.

The Indian journal of medical research·1992

Same author

An immunoradiometric assay for measurement of serum thyroglobulin.

The Indian journal of medical research·1992

Same author

Modification of radiosensitivity by the so-called tissue recovery stimulator. I. Radiosensitizing effects of solcoseryl.

Journal of radiation research·1992

Same author

Postnatal laminar development of cholinergic receptors, protein kinase C and dihydropyridine-sensitive calcium antagonist binding in rat visual cortex. Effect of visual deprivation.

International journal of developmental neuroscience : the official journal of the International Society for Developmental Neuroscience·1992

Same author

Cerebral glucose metabolic rates after 30 and 45 minute acquisitions: a comparative study.

Journal of nuclear medicine : official publication, Society of Nuclear Medicine·1992

Same author

Resolution of dihydroxyeicosanoates and of dihydroxyeicosatrienoates by chiral phase chromatography.

Analytical biochemistry·1992

Same journal

Corrigendum: Influence of nanoscale topology on the bactericidal efficiency of black silicon surfaces (2017 Nanotechnology28 245301).

Nanotechnology·2026

Same journal

Corrigendum: Thermal scanning probe lithography for the directed self-assembly of block copolymers (2017<i>Nanotechnology</i>28 175301).

Nanotechnology·2026

Same journal

Gold-nanoparticle-modified ITO electrodes: Effect of preparation methods on the electrochemical performance.

Nanotechnology·2026

Same journal

Nanoparticle manipulation with a carbon fiber tip in an electron microscope for µ-SQUID magnetometry.

Nanotechnology·2026

Same journal

Dual-frequency resonance tracking in switching spectroscopy piezoresponse force microscopy for ferroelectric thin films.

Nanotechnology·2026

Same journal

DFT and machine learning investigation of Au/Pt-decorated SnS₂ monolayers for asthma and COPD diagnosis.

Nanotechnology·2026

See all related articles

Search research articles

Related Experiment Video

Updated: Jun 3, 2026

Metal-Assisted Electrochemical Nanoimprinting of Porous and Solid Silicon Wafers

Metal-Assisted Electrochemical Nanoimprinting of Porous and Solid Silicon Wafers

Published on: February 8, 2022

Direct metal nano-imprinting using an embossed solid electrolyte stamp.

A Kumar¹, K H Hsu, K E Jacobs

¹Electrical and Computer Engineering, University of Illinois at Urbana-Champaign, 1406 W Green Street, Urbana, IL 61801, USA. anilku2@illinois.edu

|March 11, 2011

Summary

This summary is machine-generated.

This study introduces a novel method for direct metal nanostructure patterning using embossed solid electrochemical stamps. This technique enables precise fabrication of nanoscale features for advanced applications.

More Related Videos

Scalable Solution-processed Fabrication Strategy for High-performance, Flexible, Transparent Electrodes with Embedded Metal Mesh

Scalable Solution-processed Fabrication Strategy for High-performance, Flexible, Transparent Electrodes with Embedded Metal Mesh

Published on: June 23, 2017

Integration of Light Trapping Silver Nanostructures in Hydrogenated Microcrystalline Silicon Solar Cells by Transfer Printing

Integration of Light Trapping Silver Nanostructures in Hydrogenated Microcrystalline Silicon Solar Cells by Transfer Printing

Published on: November 9, 2015

Related Experiment Videos

Last Updated: Jun 3, 2026

Metal-Assisted Electrochemical Nanoimprinting of Porous and Solid Silicon Wafers

Metal-Assisted Electrochemical Nanoimprinting of Porous and Solid Silicon Wafers

Published on: February 8, 2022

Scalable Solution-processed Fabrication Strategy for High-performance, Flexible, Transparent Electrodes with Embedded Metal Mesh

Scalable Solution-processed Fabrication Strategy for High-performance, Flexible, Transparent Electrodes with Embedded Metal Mesh

Published on: June 23, 2017

Integration of Light Trapping Silver Nanostructures in Hydrogenated Microcrystalline Silicon Solar Cells by Transfer Printing

Integration of Light Trapping Silver Nanostructures in Hydrogenated Microcrystalline Silicon Solar Cells by Transfer Printing

Published on: November 9, 2015

Area of Science:

Materials Science
Nanotechnology
Electrochemistry

Background:

Direct patterning of metal nanostructures is crucial for advanced electronic and optical devices.
Existing nanofabrication techniques often face limitations in scalability and precision.
Solid superionic materials offer unique properties for microforming applications.

Purpose of the Study:

To develop a novel method for direct metal nanostructure patterning using embossed solid electrochemical stamps.
To investigate the microforming capabilities of solid superionic materials for stamp fabrication.
To demonstrate the fabrication of high-resolution silver nano-antennas and large-area patterning.

Main Methods:

Microforming of solid superionic stamps using silicon templates.
Utilizing silver sulfide (Ag₂S) as a superionic conductor with excellent microforming properties.
Characterizing stamp mechanical behavior, material flow, and feature recovery during embossing.
Demonstrating feature transferability during embossing and subsequent etching processes.

Main Results:

Successful microforming of solid superionic stamps with excellent feature transferability.
Fabrication of silver nano-antennas with sub-10 nm gaps.
Demonstration of large-area patterning capabilities with stamp diameters exceeding 6 mm.
Observation of excellent feature recovery after the embossing process.

Conclusions:

Embossing-based metal patterning using solid electrochemical stamps is a viable technique for nanofabrication.
This method offers a pathway for creating complex 2D and potentially 3D nanostructures.
The use of silver sulfide as a superionic stamp material shows promise for high-resolution patterning.