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Deep UV nano-microstructuring of substrates for surface plasmon resonance imaging
1Fitzpatrick Institute for Photonics, Duke University, Durham, NC 27708, USA.
Nanotechnology
|March 12, 2011
Summary
We fabricated plasmonic chips with nanoscale metallic lines using deep UV lithography, achieving 25 nm feature sizes. These chips exhibit tunable surface plasmon resonance, showing potential for sensitive refractive index sensing.
Area of Science:
- Nanotechnology
- Optics
- Materials Science
Background:
- Plasmonic chips enable novel optical sensing applications.
- Fabrication of nanoscale metallic structures is crucial for controlling plasmonic properties.
Purpose of the Study:
- To describe wafer-scale fabrication of plasmonic chips with micro- and nanoline structures.
- To characterize their plasmonic behavior and refractive index sensing capabilities.
Main Methods:
- Deep UV lithography for fabricating metallic micro- and nanoline structures.
- Lift-off process to achieve feature sizes as small as 25 nm.
- Experimental characterization of surface plasmon resonance (SPR) and rigorous coupled wave analysis (RCWA) for numerical confirmation.
Main Results:
- Achieved wafer-scale fabrication of plasmonic chips with feature sizes down to 25 nm.
- Demonstrated tunable surface plasmon resonance dependent on line dimensions, angle of incidence, and wavelength.
- Identified specific angulo-spectral regions of high sensitivity for refractive index sensing.
Conclusions:
- Deep UV lithography is effective for fabricating high-resolution plasmonic chips.
- The fabricated structures exhibit controllable plasmonic behaviors from localized to quasi-propagative.
- These plasmonic chips show promise for sensitive refractive index sensing applications.
