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Published on: February 25, 2017
Fabrication of three-dimensional autocloned photonic crystal on sapphire substrate
Hao Ming Ku1, Chen Yang Huang, Shiuh Chao
1Institute of Photonics Technologies, National Tsing Hua University, Hsinchu, Taiwan.
Abstract:
We applied the laser interference lithography method to form a patterned sapphire substrate (PSS). A three-dimensional photonic crystal was formed by autocloning the PSS with alternate Ta2O5/SiO2 coatings. A high total integrated reflectance (TIR) band was obtained around the 410 to 470 nm wavelength range that matched the emission spectrum of the gallium nitride (GaN) light-emitting diode (LED) for application in manipulating the light extraction of the sapphire-based GaN LED.
