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Updated: Jun 2, 2026

Fabrication of Silica Ultra High Quality Factor Microresonators
Published on: July 2, 2012
Fabrication and characterization of silicon antireflection structures for infrared rays using a femtosecond laser
Hiroshi Imamoto1, Shingo Kanehira, Xi Wang
1Core Technology Center, Omron Corporation, 9-1 Kizugawadai, Kizugawa City, Kyoto 619-0283, Japan. hiroshi_imamoto@omron.co.jp
Abstract:
We focus on IR sensors with lower reflection for the wavelength around 10 μm, strongly awaited for detecting human bodies. A concave structure was designed as a more suitable reflection-free structure for IR light, and an optical system with a femtosecond laser was employed for verification of the effectiveness of the structure. The microstructures prepared through this process were fabricated and optically measured using SEM, FT-IR, and Raman spectroscopy. The measurement revealed that good reflection-free structures were realized for IR sensors with lower reflection for the wavelength of around 10 μm.

