Jove
Visualize
Contact Us
JoVE
x logofacebook logolinkedin logoyoutube logo
ABOUT JoVE
OverviewLeadershipBlogJoVE Help Center
AUTHORS
Publishing ProcessEditorial BoardScope & PoliciesPeer ReviewFAQSubmit
LIBRARIANS
TestimonialsSubscriptionsAccessResourcesLibrary Advisory BoardFAQ
RESEARCH
JoVE JournalMethods CollectionsJoVE Encyclopedia of ExperimentsArchive
EDUCATION
JoVE CoreJoVE BusinessJoVE Science EducationJoVE Lab ManualFaculty Resource CenterFaculty Site
Terms & Conditions of Use
Privacy Policy
Policies

Related Concept Videos

You might also read

Related Articles

Articles linked to this work by shared authors, journal, and citation graph.

Sort by
Same author

Light-Mediated Contact Printing of Phosphorus Species onto Silicon Using Carbene-Based Molecular Layers.

Langmuir : the ACS journal of surfaces and colloids·2024
Same author

Vapor-Phase Halogenation of Hydrogen-Terminated Silicon(100) Using <i>N</i>-Halogen-succinimides.

ACS applied materials & interfaces·2023
Same author

Preclinical safety and efficacy characterization of an LpxC inhibitor against Gram-negative pathogens.

Science translational medicine·2023
Same author

Monolayer organic thin films as particle-contamination-resistant coatings.

Scientific reports·2023
Same author

Manufacturing-induced contamination in common multilayerdielectric gratings.

Optics express·2023
Same author

Safety of treating malaria with artemisinin-based combination therapy in the first trimester of pregnancy.

Reproductive toxicology (Elmsford, N.Y.)·2022

Related Experiment Video

Updated: Jun 2, 2026

Soft Lithographic Functionalization and Patterning Oxide-free Silicon and Germanium
12:38

Soft Lithographic Functionalization and Patterning Oxide-free Silicon and Germanium

Published on: December 16, 2011

Patterning NHS-terminated SAMs on germanium.

Carleen J Morris1, Alexander A Shestopalov, Brian H Gold

  • 1Department of Chemistry, Duke University, Durham, North Carolina 27708, United States.

Langmuir : the ACS Journal of Surfaces and Colloids
|April 21, 2011
PubMed
Summary
This summary is machine-generated.

Researchers developed a new method for creating patterned self-assembled monolayers (SAMs) on germanium surfaces. This technique enables precise control over surface chemistry for advanced semiconductor applications.

More Related Videos

Cell Patterning on Photolithographically Defined Parylene-C: SiO2 Substrates
07:19

Cell Patterning on Photolithographically Defined Parylene-C: SiO2 Substrates

Published on: March 7, 2014

Antifouling Self-assembled Monolayers on Microelectrodes for Patterning Biomolecules
10:27

Antifouling Self-assembled Monolayers on Microelectrodes for Patterning Biomolecules

Published on: August 25, 2009

Related Experiment Videos

Last Updated: Jun 2, 2026

Soft Lithographic Functionalization and Patterning Oxide-free Silicon and Germanium
12:38

Soft Lithographic Functionalization and Patterning Oxide-free Silicon and Germanium

Published on: December 16, 2011

Cell Patterning on Photolithographically Defined Parylene-C: SiO2 Substrates
07:19

Cell Patterning on Photolithographically Defined Parylene-C: SiO2 Substrates

Published on: March 7, 2014

Antifouling Self-assembled Monolayers on Microelectrodes for Patterning Biomolecules
10:27

Antifouling Self-assembled Monolayers on Microelectrodes for Patterning Biomolecules

Published on: August 25, 2009

Area of Science:

  • Materials Science
  • Surface Chemistry
  • Nanotechnology

Background:

  • Germanium is a key semiconductor material with potential in electronics.
  • Patterning surfaces with specific chemical functionalities is crucial for device fabrication.
  • Existing methods for patterning self-assembled monolayers (SAMs) are limited, especially on germanium.

Purpose of the Study:

  • To develop a simple and robust method for patterning functional self-assembled monolayers (SAMs) on germanium.
  • To demonstrate the feasibility of using catalytic soft-lithography for surface functionalization of germanium.
  • To create micrometer-scale features of chemically distinct SAMs on a semiconductor surface.

Main Methods:

  • Utilized a catalytic soft-lithographic pattern transfer approach.
  • Employed an elastomeric stamp with immobilized sulfonic acid moieties.
  • Functionalized a bilayer molecular system on germanium, comprising an alkyl monolayer and a reactive ester overlayer.
  • Used a catalytic polyurethane-acrylate stamp for pattern formation.

Main Results:

  • Successfully patterned functional SAMs on germanium surfaces.
  • Achieved micrometer-scale features of chemically distinct SAMs.
  • Demonstrated a robust and simple protocol for surface patterning.
  • This is the first reported instance of patterned SAMs on germanium.

Conclusions:

  • The developed method provides a novel way to pattern functional SAMs on germanium.
  • This technique opens possibilities for advanced germanium-based electronic devices.
  • Catalytic soft-lithography is effective for precise surface functionalization of semiconductors.