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Updated: Jun 2, 2026

Micro/Nano-scale Strain Distribution Measurement from Sampling Moiré Fringes
Published on: May 23, 2017
H Chouaib1, M E Murtagh, P V Kelly
1Optical Metrology Innovations Ltd., 2200 Cork Airport Business Park, Cork Airport, Co. Cork, Ireland. houssam.chouaib@kla-tencor.com
We developed a fast, high-throughput optical modulation spectroscopy method for analyzing strain in silicon wafers at the micrometer scale. This technique enables rapid, precise measurements for semiconductor process control.
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