Related Experiment Video
Updated: Jun 2, 2026
Niobium Oxide Films Deposited by Reactive Sputtering: Effect of Oxygen Flow Rate
Published on: September 28, 2019
Optical properties and residual stress in aluminum nitride films prepared by alternating-current dual reactive
Chien-Jen Tang1, Cheng-Chung Jaing, Kun-Hsien Lee
1Department of Optoelectronic System Engineering, Minghsin University of Science and Technology, Hsin-Chu 304, Taiwan. cjtang@must.edu.tw
Abstract:
Aluminum nitride films were deposited by alternating-current dual reactive magnetron sputtering. The influence of different nitrogen flow and working pressures at a sputtering power of 5 kW on the refractive index, extinction coefficient, crystalline structure, residual stress, and surface roughness of aluminum nitride films was discussed. The aluminum nitride film would have high refractive index, low extinction coefficient and small residual stress at suitable nitrogen flow rate and low working pressure.
