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U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen
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U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen

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Facile reduction of a uranyl(VI) β-ketoiminate complex to U(IV) upon oxo silylation

Jessie L Brown1, Charles C Mokhtarzadeh, Jeremie M Lever

  • 1Department of Chemistry and Biochemistry, University of California Santa Barbara, Santa Barbara, California 93106, USA.

Inorganic Chemistry
|May 7, 2011
PubMed

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