Optimized electron beam writing strategy for fabricating computer-generated holograms based on an effective medium...

Area of Science:

• Optics and Photonics
• Nanotechnology
• Computer-Generated Holography

Background:

• Conventional multi-height level computer-generated holograms (CGHs) require complex fabrication processes.
• The effective medium approach offers a simplified alternative using one-step binary lithography.
• Subwavelength patterning for large-scale CGH fabrication presents significant challenges, increasing writing time.

Purpose of the Study:

• To present an optimized strategy for reshaping binary subwavelength structures.
• To reduce the fabrication time for multi-phase level CGHs on electron beam writing systems.
• To demonstrate the fabrication of a three-phase level CGH using the optimized strategy.

Main Methods:

• Utilized the effective medium approach for CGH generation.
• Implemented an optimized reshaping strategy for binary subwavelength structures.
• Fabricated a three-phase level CGH in the visible spectrum using electron beam lithography.

Main Results:

• The optimized strategy successfully reduced writing time for subwavelength patterning.
• Experimental results for the three-phase level CGH were promising.
• Demonstrated the feasibility of the effective medium approach for practical CGH fabrication.

Conclusions:

• The effective medium approach combined with optimized subwavelength patterning is a viable method for CGH fabrication.
• This strategy effectively addresses the challenge of reducing fabrication time for large-scale applications.
• The presented technique shows potential for advancing CGH technology in the visible range.