Quaternary ultraviolet AlInGaN MQW laser diode performance using quaternary AlInGaN electron blocking layer

The effect of polarization-matched Al(0.25)In(0.08)Ga(0.67)N electron-blocking layer (EBL) on the optical performance of ultraviolet Al(0.08)In(0.08)Ga(0.84)N/Al(0.1)In(0.01)Ga(0.84)N multi-quantum well (MQW) laser diodes (LDs) was investigated. The polarization-matched Al(0.25)In(0.08)Ga(0.67)N electron blocking layer (EBL) was employed in an attempt to reduce the polarization effect inside the active region of the diodes. The device performance which is affected by piezoelectric was studied via drift-diffusion model for carrier transport, optical gain and losses using the simulation program of Integrated System Engineering Technical Computer Aided design (ISE TCAD). The optical performance of the LD using quaternary Al(0.25)In(0.08)Ga(0.67)N EBL was compared with the LD using ternary Al(0.3)Ga(0.7)N EBL where both materials have the same energy band gap of Eg = 3.53 eV. The self-consistent ISE-TCAD simulation program results showed that the polarization-matched quaternary Al(0.25)In(0.08)Ga(0.67)N EBL is beneficial as it confines the electrons inside the quantum well region better than ternary Al(0.3)Ga(0.7)N EBL. The results indicated that the use of Al(0.25)In(0.08)Ga(0.67)N EBL has lower threshold current and higher optical intensity than those for Al(0.3)Ga(0.7)N EBL. The effect of Al(0.25)In(0.08)Ga(0.67)N EBL thickness on the performance of LDs has also been studied. Results at room temperature indicated that lower threshold current, high slope efficiency, high output power, and high differential quantum efficiency DQE occurred when the thickness of Al(0.25)In(0.08)Ga(0.67)N EBL was 0.25 µm.