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Published on: April 1, 2020
Design rules for p-i-n diode carriers sweeping in nano-rib waveguides on SOI
Andrzej Gajda1, Lars Zimmermann, J Bruns
1Technische Universität Berlin, Fachgebiet Hochfrequenztechnik, Einsteinufer 25, 10587 Berlin, Germany. andrzej.gajda@tu-berlin.de
Abstract:
In this paper we present a detailed analysis of the carrier lifetime for a p-i-n junction on silicon nano-rib waveguides. Several factors determining efficiency of carriers removal from the waveguiding region will be discussed. We compare different structure geometries and spacings between p and n doped regions to show the way to optimize electrons and holes sweeping for CW nonlinear optical devices.
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