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Overview of Microscopy Techniques01:22

Overview of Microscopy Techniques

The early pioneers of microscopy opened a window into the invisible world of microorganisms. In 1830, Joseph Jackson Lister created an essentially modern light microscope. The 20th century saw the development of microscopes that leveraged nonvisible light, such as fluorescence microscopy that uses an ultraviolet light source and electron microscopy that uses short-wavelength electron beams. These advances significantly improved magnification, image resolution, and contrast. By comparison, the...
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Atom Probe Tomography Analysis of Exsolved Mineral Phases
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Published on: October 25, 2019

Grazing exit electron probe microanalysis for surface and particle analysis.

K Tsuji1, K Wagatsuma, R Nullens

  • 1Micro- and Trace Analysis Center, Department of Chemistry, University of Antwerp (UIA), B-2610 Antwerpen, Belgium, and Institute for Materials Research, Tohoku University, Katahira-2-1-1, Aoba, Sendai, 980-8577 Japan.

Analytical Chemistry
|June 14, 2011
PubMed
Summary
This summary is machine-generated.

We developed grazing exit electron probe microanalysis (GE-EPMA) for surface analysis. This new method enhances detection of surface elements on samples like Si wafers and Mg-salt particles.

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Area of Science:

  • Materials Science
  • Analytical Chemistry
  • Surface Science

Background:

  • Conventional electron probe microanalysis (EPMA) detects X-rays at a ~45° takeoff angle.
  • This results in signal detection from both the sample and its carrier, complicating analysis of small particles.
  • Analysis of particles on substrates requires methods that minimize substrate signal interference.

Purpose of the Study:

  • To introduce and validate a novel Grazing Exit Electron Probe Microanalysis (GE-EPMA) technique.
  • To demonstrate GE-EPMA's capability for surface-sensitive elemental analysis.
  • To assess GE-EPMA for analyzing particles deposited on surfaces.

Main Methods:

  • Developed GE-EPMA by detecting X-rays at grazing exit angles (near 0°).
  • Applied GE-EPMA to analyze silicon (Si) wafer surfaces.
  • Utilized GE-EPMA to analyze magnesium (Mg)-salt particles on Si wafers.

Main Results:

  • GE-EPMA enabled surface-sensitive analysis of Si wafers with reduced background noise.
  • An increased O Kα to Si Kα intensity ratio at low angles indicated native Si oxide formation.
  • Mg Kα X-rays from Mg-salt particles were detected with minimal Si Kα signal at grazing exit angles (<0.5°).

Conclusions:

  • GE-EPMA significantly improves surface elemental detection by minimizing signals from deeper sample regions.
  • The technique is effective for analyzing surface layers and individual particles on substrates.
  • GE-EPMA offers a powerful tool for detailed surface and particle investigation.