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Updated: May 31, 2026

Antifouling Self-assembled Monolayers on Microelectrodes for Patterning Biomolecules

Antifouling Self-assembled Monolayers on Microelectrodes for Patterning Biomolecules

Published on: August 25, 2009

Nanopatterned self-assembled monolayers.

Gabriel G Baralia¹, Antoine Pallandre, Bernard Nysten

¹Unité de Physique et de Chimie des Hauts Polymères (POLY) and Research Center on Micro- and Nanoscopic Materials and Electronic Devices (CeRMiN), Université Catholique de Louvain, Place Croix du Sud, 1, B-1348 Louvain-la-Neuve, Belgium.

|July 6, 2011

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Chemically nanopatterned gold surfaces were fabricated using electron-beam lithography and thiolization, achieving ~4 nm line-edge roughness. This method enables precise nanoscale surface modification for advanced applications.

Area of Science:

Materials Science
Surface Chemistry
Nanotechnology

Background:

Chemically nanopatterned surfaces are crucial for advanced applications in electronics and biosensing.
Fabricating high-resolution patterns with controlled chemical functionality remains a challenge.

Purpose of the Study:

To report the fabrication of chemically nanopatterned gold surfaces.
To investigate the resolution limits and characteristics of self-assembled monolayers within nanofeatures.
To compare thiol and silane chemistries for nanopatterning.

Main Methods:

Combining electron-beam lithography with gas and liquid phase thiolization.
Characterizing line-edge roughness and feature size using high-resolution microscopy.
Analyzing monolayer packing density and interfacial behavior.

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A Technique to Functionalize and Self-assemble Macroscopic Nanoparticle-ligand Monolayer Films onto Template-free Substrates

A Technique to Functionalize and Self-assemble Macroscopic Nanoparticle-ligand Monolayer Films onto Template-free Substrates

Published on: May 9, 2014

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Last Updated: May 31, 2026

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Published on: August 25, 2009

Creating Two-Dimensional Patterned Substrates for Protein and Cell Confinement

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Published on: September 6, 2011

A Technique to Functionalize and Self-assemble Macroscopic Nanoparticle-ligand Monolayer Films onto Template-free Substrates

A Technique to Functionalize and Self-assemble Macroscopic Nanoparticle-ligand Monolayer Films onto Template-free Substrates

Published on: May 9, 2014

Main Results:

Achieved line-edge roughness of approximately 4 nm, enabling feature sizes around 15 nm.
Observed lower packing density and thiol bleeding along grain boundaries in nanofeatures.
Demonstrated comparable line-edge roughness for thiol and silane monolayers on different substrates.

Conclusions:

Electron-beam lithography combined with thiolization is effective for creating high-resolution chemically nanopatterned gold surfaces.
Lithography resolution is the current limiting factor for achieving even smaller feature sizes.
Thiol and silane chemistries offer distinct advantages and disadvantages for surface nanopatterning.