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Related Concept Videos

Inductively Coupled Plasma Atomic Emission Spectroscopy: Principle01:19

Inductively Coupled Plasma Atomic Emission Spectroscopy: Principle

Inductively coupled plasma (ICP) is the most widely used plasma source in atomic emission spectroscopy (AES), also known as Inductively Coupled Plasma Optical Emission Spectroscopy (ICP-OES). The ICP source, or torch, consists of three concentric quartz tubes with argon gas flowing through them. A spark from a Tesla coil initiates the ionization of argon, generating a high-temperature plasma.
The ions and electrons produced interact with the fluctuating magnetic field created by a water-cooled...
Inductively Coupled Plasma–Mass Spectrometry (ICP–MS): Overview01:19

Inductively Coupled Plasma–Mass Spectrometry (ICP–MS): Overview

In inductively coupled plasma–mass spectrometry (ICP–MS), an inductively coupled plasma (ICP) torch is used as an atomizer and ionizer. Solid samples are dissolved and volatilized before being introduced into the high-temperature argon plasma, while solution samples are nebulized and passed through the high-temperature argon plasma. Plasma dissociates the analytes and ionizes their component atoms to form a mixture of positive ions and molecular species. The positive ions are then passed on to...
Inductively Coupled Plasma-Mass Spectrometry (ICP-MS): Interferences01:20

Inductively Coupled Plasma-Mass Spectrometry (ICP-MS): Interferences

Inductively coupled plasma–mass spectrometry (ICP–MS) is a highly selective and sensitive technique for accurate elemental analysis. Though the analysis of ICP–MS mass spectra is comparatively straightforward, it is affected by spectroscopic and non-spectroscopic interferences. Spectroscopic interferences arise when the plasma contains ionic species with an m/z value the same as the analyte ion. Spectroscopic interference can be categorized as isobaric, polyatomic ions, and refractory oxide ion...
Inductively Coupled Plasma Atomic Emission Spectroscopy: Instrumentation01:26

Inductively Coupled Plasma Atomic Emission Spectroscopy: Instrumentation

Inductively coupled plasma (ICP) is the common plasma source used in atomic emission spectroscopy (AES), a technique that detects and analyzes various elements in a sample. This method is often called inductively coupled plasma atomic emission spectroscopy (ICP-AES).
There are three main types of inductively coupled plasma atomic emission spectroscopy  (ICP-AES) instruments: sequential, simultaneous multichannel, and Fourier transform instruments, with the latter being less commonly used.
Atomic Emission Spectroscopy: Interference01:30

Atomic Emission Spectroscopy: Interference

In atomic emission spectroscopy (AES), high-temperature atomizers excite a broad range of elements and molecules that generate complex emissions from sources such as oxides, hydroxides, and flame combustion products in the flame or plasma. Several strategies can be employed to minimize spectral interferences caused by overlapping emission lines or bands. These include increasing instrument resolution, choosing alternative emission lines, optimally placing the detector in low-background regions,...
Atomic Emission Spectroscopy: Instrumentation01:22

Atomic Emission Spectroscopy: Instrumentation

The instrumentation of atomic emission spectrometry (AES) involves various components, including atomization devices that convert samples into gas-phase atoms and ions. There are two main types of atomization devices: continuous and discrete atomizers.  Continuous atomizers, like plasmas and flames, introduce samples in a constant stream, while discrete atomizers inject individual samples using syringes or autosamplers. The most common discrete atomizer is the electrothermal atomizer.

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Synthesis of In37P20(O2CR)51 Clusters and Their Conversion to InP Quantum Dots
08:21

Synthesis of In37P20(O2CR)51 Clusters and Their Conversion to InP Quantum Dots

Published on: May 7, 2019

Argon-plasma-induced InAs/InGaAs/InP quantum dot intermixing.

Zongyou Yin1, Xiaohong Tang, Chee-Wei Lee

  • 1Photonics Research Centre, School of Electrical and Electronic Engineering, Nanyang Technological University, 639798, Singapore.

Nanotechnology
|July 6, 2011
PubMed
Summary

Argon plasma treatment effectively tunes the energy bandgap of Indium Arsenide/Indium Gallium Arsenide/Indium Phosphide quantum dots (QDs) by creating defects. This method enhances photoluminescence intensity and narrows linewidths without material degradation.

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Area of Science:

  • Materials Science
  • Semiconductor Physics
  • Nanotechnology

Background:

  • Self-assembled quantum dots (QDs) are crucial for optoelectronic devices.
  • Tuning the energy bandgap of QDs is essential for device performance.
  • Post-growth modification techniques are needed to precisely control QD properties.

Purpose of the Study:

  • To investigate argon (Ar)-plasma-enhanced intermixing of InAs/InGaAs/InP quantum dots (QDs).
  • To tune the energy bandgap and photoluminescence (PL) properties of QDs.
  • To evaluate Ar-plasma exposure as a post-growth technique for QD bandgap engineering.

Main Methods:

  • Utilized an inductively coupled plasma reactive ion etch system for Ar-plasma exposure.
  • Optimized Ar-plasma exposure time and rapid thermal annealing temperature.
  • Analyzed changes in photoluminescence (PL) intensity and linewidth.

Main Results:

  • Ar-plasma exposure created point defects, enhancing intermixing between QDs and barrier layers.
  • Observed a 160 nm blueshift and increased PL intensity after 90 s Ar-plasma exposure.
  • Achieved a further 330 nm blueshift, 2.5x PL intensity increase, and 37 nm linewidth narrowing after annealing at 720°C.

Conclusions:

  • Ar-plasma exposure is an efficient post-growth technique for tuning QD energy bandgaps.
  • This method allows for significant bandgap tuning without degrading material quality.
  • The study demonstrates a viable approach for optimizing QD optoelectronic properties.