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Related Experiment Video

Updated: May 31, 2026

Fabrication and Visualization of Capillary Bridges in Slit Pore Geometry
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Fabrication and Visualization of Capillary Bridges in Slit Pore Geometry

Published on: January 9, 2014

Junction fabrication by shadow evaporation without a suspended bridge.

Florent Lecocq1, Ioan M Pop, Zhihui Peng

  • 1Institut Néel, CNRS and Université Joseph Fourier, Grenoble, France.

Nanotechnology
|July 9, 2011
PubMed
Summary

A new shadow evaporation method fabricates Josephson junctions and capacitors without bridges. This bridge-free technique enhances mechanical robustness and qubit coherence times, demonstrating high-quality junction fabrication.

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Area of Science:

  • Quantum computing
  • Nanofabrication
  • Materials science

Background:

  • Fabricating high-quality Josephson junctions and capacitors is crucial for quantum computing.
  • Existing methods often rely on suspended bridges, which can limit mechanical robustness and scalability.

Purpose of the Study:

  • To introduce a novel, bridge-free shadow evaporation technique for fabricating Josephson junctions and capacitors.
  • To demonstrate the improved performance of quantum devices fabricated using this new method.

Main Methods:

  • Utilizing e-beam lithography with strongly asymmetric undercuts on a bilayer resist for in situ fabrication.
  • Fabricating Al/AlO(x)/Al Josephson junctions, phase qubits, and capacitors using a 100 kV e-beam writer.
  • Discussing implementation with conventional 20 kV e-beam systems.

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Related Experiment Videos

Last Updated: May 31, 2026

Fabrication and Visualization of Capillary Bridges in Slit Pore Geometry
11:20

Fabrication and Visualization of Capillary Bridges in Slit Pore Geometry

Published on: January 9, 2014

The Preparation of Electrohydrodynamic Bridges from Polar Dielectric Liquids
10:03

The Preparation of Electrohydrodynamic Bridges from Polar Dielectric Liquids

Published on: September 30, 2014

Fabrication of Uniform Nanoscale Cavities via Silicon Direct Wafer Bonding
10:32

Fabrication of Uniform Nanoscale Cavities via Silicon Direct Wafer Bonding

Published on: January 9, 2014

Main Results:

  • Achieved junction size scalability from 10⁻² µm² to over 10⁴ µm² without bridges.
  • Demonstrated enhanced mechanical robustness of the resist mask.
  • Observed longer phase qubit coherence times compared to devices fabricated with standard techniques.

Conclusions:

  • The bridge-free shadow evaporation technique offers a robust and scalable approach for fabricating high-quality Josephson junctions and capacitors.
  • This method significantly improves the performance of quantum devices, particularly phase qubits.
  • The technique is compatible with both high-voltage and conventional e-beam lithography systems.