Design of the double-telecentric high-aperture diffractive-refractive objectives
Grigoriy I Greisukh1, Evgeniy G Ezhov, Il'ya A Levin
1Penza State University of Architecture and Construction, 28 Titov Street, 440028 Penza, Russia. grey@pguas.ru
Applied Optics
|July 12, 2011
Summary
This study explores using fewer diffractive lenses in nanolithography objectives to match conventional multi-lens performance. Aspheric substrates effectively correct chromatic aberration from excimer lasers.
Area of Science:
- Optics
- Optical Engineering
- Nanolithography
Background:
- Conventional nanolithography objectives often require multiple lenses.
- Diffractive lenses offer potential for miniaturization but can introduce chromatic aberrations.
- Excimer lasers used in nanolithography present chromatic challenges.
Purpose of the Study:
- To investigate the feasibility of achieving high optical performance in nanolithography objectives with a minimal number of diffractive lenses.
- To address and solve the chromatic aberration issues associated with excimer laser use in such systems.
Main Methods:
- Consideration of optical performance metrics for novel objective designs.
- Application of aspheric substrates to mitigate chromatic aberrations.
- Analysis of axial color and spherochromatic aberration reduction.
Main Results:
- Demonstrated possibility of matching conventional multi-lens objective performance with fewer diffractive elements.
- Successful implementation of aspheric substrates to correct chromatic aberration.
- Significant reduction in both axial color and spherochromatic aberration achieved.
Conclusions:
- Objectives with a minimum number of diffractive lenses can achieve nanolithography optical performance comparable to conventional designs.
- Aspheric substrates are an effective solution for chromatic aberration problems when using excimer lasers.
- This approach offers a pathway to more compact and potentially cost-effective nanolithography systems.
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