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Fabrication of Flexible Image Sensor Based on Lateral NIPIN Phototransistors
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Color filters including infrared cut-off integrated on CMOS image sensor.

Laurent Frey1, Pascale Parrein, Jacques Raby

  • 1CEA, LETI, MINATEC, Grenoble, France. laurent.frey@cea.fr

Optics Express
|July 13, 2011
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Summary

This study presents a new CMOS image sensor design using metal/dielectric filters for color imaging. The novel filter stack reduces thickness, potentially improving performance for smaller pixels.

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Area of Science:

  • Optoelectronics
  • Image Sensors
  • Materials Science

Background:

  • Traditional color filters in CMOS image sensors often use color resists.
  • Infrared cut-off filters are typically employed to manage spectral response.
  • Thicker filter stacks can lead to optical crosstalk, especially in smaller pixels.

Purpose of the Study:

  • To develop and evaluate a novel color filter stack for CMOS image sensors.
  • To investigate the potential of metal/dielectric filters to replace traditional color resists.
  • To assess the impact of a reduced filter thickness on image quality and optical crosstalk.

Main Methods:

  • A CMOS image sensor was utilized without an infrared cut-off filter.
  • Red, green, and blue filters were implemented using a Bayer pattern with a 1.75 µm pixel pitch.
  • The color filters were fabricated via thickness variation in a 7-layer stack using four photolithography levels.

Main Results:

  • The developed filter stack achieved color separation through thickness modulation of only two layers.
  • The total filter stack thickness was approximately half that of traditional color resists.
  • Optimized spectral responses are expected to yield color errors and signal-to-noise ratios comparable to conventional methods.

Conclusions:

  • The novel metal/dielectric filter stack offers a promising alternative for CMOS image sensors.
  • Reduced filter thickness presents an opportunity to mitigate optical crosstalk in advanced, smaller pixel designs.
  • The technology demonstrates potential for comparable or improved performance over existing color filter solutions.