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Updated: May 31, 2026
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Functional Surface-immobilization of Genes Using Multistep Strand Displacement Lithography
Published on: October 25, 2018
Molecular lithography through DNA-mediated etching and masking of SiO2
Sumedh P Surwade1, Shichao Zhao, Haitao Liu
1Department of Chemistry, University of Pittsburgh, Pittsburgh, Pennsylvania 15260, USA.
Journal of the American Chemical Society
|July 15, 2011
Abstract:
We demonstrate a new approach to pattern transfer for bottom-up nanofabrication. We show that DNA promotes/inhibits the etching of SiO(2) at the single-molecule level, resulting in negative/positive tone pattern transfers from DNA to the SiO(2) substrate.
