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Updated: May 30, 2026

Surface Functionalization of Metal-Organic Frameworks for Improved Moisture Resistance
Published on: September 5, 2018
Photolabile protecting groups in metal-organic frameworks: preventing interpenetration and masking functional groups
Rajesh K Deshpande1, Geoffrey I N Waterhouse, Geoffrey B Jameson
1MacDiarmid Institute for Advanced Materials and Nanotechnology, Institute of Fundamental Sciences, Palmerston North, New Zealand.
Abstract:
Photolabile groups can be incorporated into metal-organic frameworks (MOFs) and then quantitatively cleaved following MOF formation. Here, a 2-nitrobenzyl ether prevents lattice interpenetration (catenation) in a cubic MOF derived from zinc(II). Subsequent photolysis unmasks a hydroxyl group, and produces an open MOF that cannot be synthesized directly.
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