Photolabile protecting groups in metal-organic frameworks: preventing interpenetration and masking functional groups

Rajesh K Deshpande1, Geoffrey I N Waterhouse, Geoffrey B Jameson

  • 1MacDiarmid Institute for Advanced Materials and Nanotechnology, Institute of Fundamental Sciences, Palmerston North, New Zealand.

Chemical Communications (Cambridge, England)
|July 23, 2011
PubMed

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