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Ohmic Contact Fabrication Using a Focused-ion Beam Technique and Electrical Characterization for Layer Semiconductor Nanostructures
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The microstructure and electrical conductivity of mixed-valence TlIn(4)S(5)Cl quaternary compound micro- and

Xin Jiang1, Hans-Jörg Deiseroth, Changzhi Gu

  • 1Institute of Materials Engineering, University of Siegen, Paul-Bonatz-Straße 9-11, D-57076 Siegen, Germany.

Nanotechnology
|August 10, 2011
PubMed

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