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Published on: July 17, 2015
Step contrast reversal in LEEM during Pb deposition on W(110)
Summary
Anomalous step contrast in low energy electron microscopy (LEEM) images during lead (Pb) deposition on a tungsten (W) surface was observed. Contrast reversal is linked to a 2D Pb gas, followed by crystallization, altering step visibility.
Area of Science:
- Surface Science
- Materials Science
- Condensed Matter Physics
Background:
- Low Energy Electron Microscopy (LEEM) is a powerful surface-sensitive technique.
- Understanding surface phenomena during thin film deposition is crucial for materials development.
- Tungsten (W) and Lead (Pb) systems are relevant in various technological applications.
Purpose of the Study:
- To investigate the anomalous step contrast observed during Pb deposition on a W(110) surface using LEEM.
- To correlate the observed contrast changes with the surface atomic density and phase transitions of Pb.
- To elucidate the mechanisms behind contrast reversal and anomalous intensity profiles.
Main Methods:
- Low Energy Electron Microscopy (LEEM) was employed to image the W(110) surface during Pb deposition.
- In-situ observation of surface morphology and step contrast changes at approximately 200°C.
- Analysis of the relationship between Pb coverage, surface atomic density, and step contrast.
Main Results:
- Anomalous step contrast was observed, changing from dark to bright upon initial Pb deposition.
- The bright contrast was attributed to the presence of a two-dimensional (2D) Pb gas with a specific atomic density distribution.
- Further Pb deposition led to a reversal of contrast (steps becoming dark) with an anomalous intensity profile, indicating 2D crystallization.
Conclusions:
- The observed anomalous step contrast in LEEM is directly related to the dynamic processes of Pb adsorption and phase transitions on the W(110) surface.
- The study highlights the sensitivity of LEEM to surface atomic density variations and 2D gas formation.
- The findings provide insights into the initial stages of thin film growth and surface restructuring.

