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Updated: May 30, 2026
Atomically Traceable Nanostructure Fabrication
Published on: July 17, 2015
High speed fabrication of aluminum nanostructures with 10 nm spatial resolution by electrochemical replication
Sajal Biring1, Kun-Tong Tsai, Ujjal Kumar Sur
1Taiwan International Graduate Program, Department of Chemistry, National Tsing-Hua University, Hsinchu, Taiwan. Institute of Atomic and Molecular Sciences, Academia Sinica, PO Box 23-166, Taipei 10617, Taiwan.
Abstract:
A high fidelity electrochemical replication technique for the rapid fabrication of Al nanostructures with 10 nm lateral resolution has been successfully demonstrated. Aluminum is electrodeposited onto a lithographically patterned Si master using a non-aqueous organic hydride bath of aluminum chloride and lithium aluminum hydride at room temperature. Chemical pretreatment of the Si surface allows a clean detachment of the replicated Al foil from the master, permitting its repetitive use for mass replication. This high throughput technique opens up new possibilities in the fabrication of Al-related nanostructures, including the growth of long range ordered anodic alumina nanochannel arrays.
