Nanoimprint lithography patterns with a vertically aligned nanoscale tubular carbon structure

Area of Science:

• Materials Science
• Nanotechnology
• Lithography

Background:

• Nanoimprint lithography (NIL) is a key technique for fabricating nanoscale structures.
• Developing efficient and high-resolution molds is crucial for advancing NIL applications.
• Carbon-based nanostructures offer unique properties for advanced fabrication.

Purpose of the Study:

• To demonstrate a nanoscale tubular carbon structure array as a novel mold for nanoimprint lithography.
• To develop a method for fabricating vertically aligned, hexagonally packed nanoscale carbon pillars.
• To achieve high-density inverse replication of these carbon structures onto a resist material.

Main Methods:

• Fabrication of a nanotemplate using anodic aluminum oxide (AAO).
• Growth of carbon within the AAO nanotemplate to form a tubular carbon structure array.
• Controlled chemical etching to remove the AAO layer, yielding the carbon mold.
• Application of the carbon mold in nanoimprint lithography with a UV-curable resist.

Main Results:

• Successfully fabricated a vertically formed and hexagonally aligned nanoscale tubular carbon array.
• Achieved a high density of nanoscale carbon pillars (over 10^10 cm^-2) with controlled diameters and lengths.
• Demonstrated the first-time inverse replication of these carbon pillars onto a UV-curable resist using NIL.

Conclusions:

• A nanoscale tubular carbon structure array can serve as an effective mold for nanoimprint lithography.
• The developed fabrication method allows for high-density, controlled replication of nanoscale features.
• This work presents a promising approach for advanced nanofabrication using carbon-based molds.