Updated: May 30, 2026

Monolayer Contact Doping of Silicon Surfaces and Nanowires Using Organophosphorus Compounds
Published on: December 2, 2013
M T Borgström1, E Norberg, P Wickert
1Solid State Physics, Lund University, Box 118, S-221 00 Lund, Sweden.
Researchers developed a method to create both n-type and p-type Indium Phosphide (InP) nanowires using tetraethyltin (TESn) and dimethylzinc (DMZn). These doped nanowires enable the fabrication of functional pn-junctions and light-emitting diodes.
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