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Monolayer Contact Doping of Silicon Surfaces and Nanowires Using Organophosphorus Compounds
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Precursor evaluation for in situ InP nanowire doping.

M T Borgström1, E Norberg, P Wickert

  • 1Solid State Physics, Lund University, Box 118, S-221 00 Lund, Sweden.

Nanotechnology
|August 12, 2011
PubMed
Summary

Researchers developed a method to create both n-type and p-type Indium Phosphide (InP) nanowires using tetraethyltin (TESn) and dimethylzinc (DMZn). These doped nanowires enable the fabrication of functional pn-junctions and light-emitting diodes.

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Area of Science:

  • Semiconductor Nanowire Synthesis
  • Materials Science
  • Nanotechnology

Background:

  • Indium Phosphide (InP) nanowires are promising for electronic and optoelectronic applications.
  • Precise control over doping is crucial for creating functional semiconductor devices.
  • Existing doping methods for InP nanowires often face limitations in controllability and scalability.

Purpose of the Study:

  • To report the in situ doping of InP nanowires using tetraethyltin (TESn) and dimethylzinc (DMZn) as precursors.
  • To demonstrate predictable synthesis of n-type and p-type InP nanowires.
  • To fabricate axial pn-junctions and investigate their properties.

Main Methods:

  • Particle-assisted growth of InP nanowires.
  • In situ doping using TESn for n-type and DMZn for p-type doping.

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  • Gate voltage dependent transport measurements for characterization.
  • Optimization of growth conditions to control tapering and create pn-junctions.
  • Main Results:

    • Predictable synthesis of n-type and p-type InP nanowires achieved.
    • Achieved n-type doping concentration tunable from 10^17 to 10^19 cm^-3 with increasing TESn.
    • Observed saturation of p-type doping with DMZn, potentially due to increased growth rates.
    • Fabricated axial pn-junctions exhibiting rectifying behavior.
    • Demonstrated light emission from the fabricated pn-junctions.

    Conclusions:

    • TESn and DMZn are effective in situ precursors for n-type and p-type doping of InP nanowires, respectively.
    • The doping behavior differs significantly between n-type and p-type precursors.
    • Optimized growth conditions allow for the creation of functional pn-junctions and light-emitting diodes from doped InP nanowires.