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Updated: May 30, 2026
Selective Area Modification of Silicon Surface Wettability by Pulsed UV Laser Irradiation in Liquid Environment
Published on: November 9, 2015
Chemical-assisted laser parallel nanostructuring of silicon in optical near fields
Wei Guo1, Zeng Bo Wang, Lin Li
1Laser Processing Research Centre, School of Mechanical, Aerospace and Civil Engineering, University of Manchester, Sackville Street, Manchester M60 1QD, UK. Corrosion and Protection Centre, School of Materials, University of Manchester, The Mill, Manchester M60 1QD, UK.
Abstract:
The authors present a simple and efficient technique for producing hexagonal arrays of nanostructures on silicon surfaces in chemical solutions. It utilizes the effect of optical near-field enhancement by self-assembled particle-lens arrays and a thermally induced chemical reaction with an alkaline solution. About 10(8) features can be produced simultaneously by one single laser pulse. Furthermore, the shape of the structures was found to be controllable, from concave holes to convex bumps, by means of a post-etching process, in the same chemical solution.
