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Updated: May 30, 2026

Fabrication of Low Temperature Carbon Nanotube Vertical Interconnects Compatible with Semiconductor Technology
Published on: December 7, 2015
Simple, low-cost technique for photolithographic self-aligned top metal contacts to nanowires and nanotubes
1Singapore-MIT Alliance, 4 Engineering Drive 3, 117576, Singapore.
Abstract:
We propose a new simple, low-cost method for providing all-round metal contacts to one-dimensional structures such as carbon nanotubes and nanowires on a transparent substrate. The nanostructures are first positioned in place to bridge a electrode gap by dielectrophoresis. The electrode structure is then used as a self-aligned mask during the subsequent photolithography through illumination from the substrate backside. This is followed by metallization and lift-off. Our measurements on multi-walled carbon nanotubes thus contacted show reasonable yield and good electrical contacts for the process carried out on a glass slide as the substrate.

