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Updated: May 30, 2026

Patterning of Microorganisms and Microparticles through Sequential Capillarity-assisted Assembly
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Patterning functional materials using channel diffused plasma-etched self-assembled monolayer templates.

Antony George1, A Wouter Maijenburg, Michiel G Maas

  • 1Inorganic Materials Science Group, MESA+ Institute for Nanotechnology, University of Twente, P.O. Box 217, 7500 AE Enschede, The Netherlands.

Langmuir : the ACS Journal of Surfaces and Colloids
|August 24, 2011
PubMed
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This study presents a cost-effective method for creating micrometer-scale patterns of functional materials using self-assembled monolayers (SAM) as templates for deposition. This technique enables precise patterning of various materials for diverse applications.

Area of Science:

  • Materials Science
  • Nanotechnology
  • Surface Chemistry

Background:

  • Precise control over material placement is crucial for advanced device fabrication.
  • Existing patterning methods can be complex, costly, or limited in material compatibility.

Purpose of the Study:

  • To develop a simple, cost-effective, large-area method for micrometer-scale patterning of functional materials.
  • To utilize patterned self-assembled monolayers (SAM) as templates for selective material deposition.

Main Methods:

  • Micropatterning of self-assembled monolayers (SAM) of alkyl thiols on gold substrates using channel-diffused oxygen plasma etching.
  • Protection of selected SAM areas using a soft lithographic stamp during plasma treatment.
  • Site-selective deposition of functional materials (ZnO, Ni, Ag thin films, ZnO nanowires) using patterned SAMs as templates via electrodeposition, electroless deposition, and solution-phase methods.

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Last Updated: May 30, 2026

Patterning of Microorganisms and Microparticles through Sequential Capillarity-assisted Assembly
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Plasma Lithography Surface Patterning for Creation of Cell Networks
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Main Results:

  • Successful micrometer-scale patterning of SAMs on gold surfaces.
  • Demonstrated site-selective deposition of various functional materials, including ZnO, Ni, and Ag thin films, as well as ZnO nanowires.
  • Characterization of patterned SAMs and deposited materials using SEM, XRD, AFM, and TUNA.

Conclusions:

  • The developed methodology offers a versatile and efficient approach for fabricating patterned functional materials at the micrometer scale.
  • This technique provides a cost-effective solution for large-area patterning, applicable to a wide range of metallic and oxidic materials.
  • The patterned SAMs effectively serve as templates, enabling precise control over material growth and placement for potential applications in electronics and sensors.