Large-scale ordered silicon microtube arrays fabricated by Poisson spot lithography

A novel approach based on the Poisson spot effect in a conventional optical lithography system is presented for fabricating large-scale ordered ring patterns at low cost, in which the pattern geometries are tuned by controlling the exposure dose and deliberate design of the mask patterns. Following this by cryogenic deep etching, the ring patterns are transferred into Si substrates, resulting in various vertical tubular Si array structures. Microscopic analysis indicates that the as-fabricated Si microtubes have smooth interior and exterior surfaces that are uniform in size, shape and wall-thickness, which exhibit potential applications as electronic, biological and medical devices.