Related Experiment Video
Updated: May 29, 2026

Fabrication of Low Temperature Carbon Nanotube Vertical Interconnects Compatible with Semiconductor Technology
Published on: December 7, 2015
Carbon nanotube memory by the self-assembly of silicon nanocrystals as charge storage nodes
Mario Olmedo1, Chuan Wang, Koungmin Ryu
1Department of Electrical Engineering, University of California, Riverside, California 92521, United States.
Abstract:
A memory structure based on self-aligned silicon nanocrystals (Si NCs) grown over Al(2)O(3)-covered parallel-aligned carbon nanotubes (CNTs) by gas source molecular beam epitaxy is reported. Electrostatic force microscopy characterizations directly prove the charging and discharging of discrete NCs through the Al(2)O(3) layer covering the CNTs. A CNT field effect transistor based on the NC/CNT structure is fabricated and characterized, demonstrating evident memory characteristics. Direct tunneling and Fowler-Nordheim tunneling phenomena are observed at different programming/erasing voltages. Retention is demonstrated to be on the order of 10(4) s. Although there is still plenty of room to enhance the performance, the results suggest that CNT-based NC memory with diminutive CNTs and NCs could be an alternative structure to replace traditional floating gate memory.

